Is a
Patent attributes
Patent Applicant
Current Assignee
Patent Jurisdiction
Patent Number
Date of Patent
December 25, 2018
Patent Application Number
14762224
Date Filed
February 3, 2014
Patent Citations Received
Patent Primary Examiner
Patent abstract
An annular lid plate of a plasma reactor has upper and lower layers of gas distribution channels distributing gas along equal length paths from gas supply lines to respective gas distribution passages of a ceiling gas nozzle.
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