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US Patent 11244811 Plasma reactor with highly symmetrical four-fold gas injection

Patent 11244811 was granted and assigned to Applied Materials on February, 2022 by the United States Patent and Trademark Office.

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Patent abstract

An annular lid plate of a plasma reactor has upper and lower layers of gas distribution channels distributing gas along equal length paths from gas supply lines to respective gas distribution passages of a ceiling gas nozzle.

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