US Patent 11244811 Plasma reactor with highly symmetrical four-fold gas injection
Patent 11244811 was granted and assigned to Applied Materials on February, 2022 by the United States Patent and Trademark Office.
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Patent abstract
An annular lid plate of a plasma reactor has upper and lower layers of gas distribution channels distributing gas along equal length paths from gas supply lines to respective gas distribution passages of a ceiling gas nozzle.
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Patent Inventor Names
Bojenna Keating0
Imad Yousif0
Kyle Tantiwong0
Samer Banna0
Vladimir Knyazik0
Yan Rozenzon0
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US Patent 11244811 Plasma reactor with highly symmetrical four-fold gas injection
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Is a
Patent applicant
Current assignee
Patent jurisdiction
Patent number
11244811
Date of patent
February 8, 2022
Patent application number
16226536
Date Filed
December 19, 2018
Patent citations
Patent primary examiner
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