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US Patent 11854769 Adjustable fastening device for plasma gas injectors

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Contents

Is a
Patent
Patent
0

Patent attributes

Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
0
Patent Number
118547690
Patent Inventor Names
Chien-Fang Lin0
Ching-Yu Chang0
Chiao-Kai Chang0
Yung-Shun Hsu0
Wai Hong Cheah0
Date of Patent
December 26, 2023
0
Patent Application Number
178334040
Date Filed
June 6, 2022
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Patent Citations
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US Patent 8475625 Apparatus for etching high aspect ratio features
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US Patent 8800484 Plasma processing apparatus
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US Patent 8828182 Process chamber gas flow improvements
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US Patent 9051647 Tunable multi-zone gas injection system
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US Patent 9162236 Proportional and uniform controlled gas flow delivery for dry plasma etch apparatus
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US Patent 9767993 Plasma processing apparatus
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US Patent 10163606 Plasma reactor with highly symmetrical four-fold gas injection
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US Patent 9904013 Light guide with optical element molded thereto
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...
Patent Primary Examiner
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Shahed Ahmed
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CPC Code
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H01J 37/32513
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H01J 2237/3341
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H01L 21/6831
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H01L 21/3065
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H01L 21/67069
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H01L 22/26
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H01L 21/31116
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H01L 21/31138
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Patent abstract

An embodiment is an apparatus, such as a plasma chamber. The apparatus includes chamber walls and a chamber window defining an enclosed space. A chamber window is disposed between a plasma antenna and a substrate support. A gas delivery source is mechanically coupled to the chamber window. The gas delivery source comprises a gas injector having a passageway, a window at a first end of the passageway, and a nozzle at a second end of the passageway. The nozzle of the gas delivery source is disposed in the enclosed space. A fastening device is mechanically coupled to the gas delivery source. The fastening device is adjustable to adjust a sealing force against the gas injector.

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