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US Patent D913979 Inner shield for a substrate processing chamber

Patent D913979 was granted and assigned to Applied Materials on March, 2021 by the United States Patent and Trademark Office.

OverviewStructured DataIssuesContributorsActivity
Is a
Patent
Patent
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Current Assignee
Applied Materials
Applied Materials
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Date Filed
August 28, 2019
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Date of Patent
March 23, 2021
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Patent Applicant
Applied Materials
Applied Materials
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Patent Application Number
29703655
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Patent Citations Received
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US Patent D998575 Collimator for use in a physical vapor deposition (PVD) chamber
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US Patent 12080522 Preclean chamber upper shield with showerhead
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US Patent D1012051 Electrostatic chuck for semiconductor manufacturing device
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US Patent D1007449 Target profile for a physical vapor deposition chamber target
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Patent Inventor Names
Ananthkrishna Jupudi
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Junqi Wei
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Kang Zhang
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Kelvin Boh
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Sarath Babu
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Yueh Sheng Ow
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Yuichi Wada
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Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
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Patent Number
D913979
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Patent Primary Examiner
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Michael C Stout
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