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US Patent D913979 Inner shield for a substrate processing chamber

Patent D913979 was granted and assigned to Applied Materials on March, 2021 by the United States Patent and Trademark Office.

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Is a

Patent

Patent attributes

Patent Applicant

Applied Materials

Current Assignee

Applied Materials

Patent Jurisdiction

United States Patent and Trademark Office

Patent Number

D9139790

Patent Inventor Names

Ananthkrishna Jupudi0

Junqi Wei0

Kang Zhang0

Kelvin Boh0

Sarath Babu0

Yueh Sheng Ow0

Yuichi Wada0

Date of Patent

March 23, 2021

Patent Application Number

297036550

Date Filed

August 28, 2019

Patent Citations Received

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US Patent D998575 Collimator for use in a physical vapor deposition (PVD) chamber

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US Patent 12080522 Preclean chamber upper shield with showerhead

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US Patent D1012051 Electrostatic chuck for semiconductor manufacturing device

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US Patent D1007449 Target profile for a physical vapor deposition chamber target

Patent Primary Examiner

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Michael C Stout

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