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US Patent 9812305 Rate enhanced pulsed DC sputtering system

Patent 9812305 was granted and assigned to ADVANCED ENERGY INDUSTRIES, INC. on November, 2017 by the United States Patent and Trademark Office.

OverviewStructured DataIssuesContributorsActivity
Is a
Patent
Patent
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Current Assignee
ADVANCED ENERGY INDUSTRIES, INC.
ADVANCED ENERGY INDUSTRIES, INC.
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Date Filed
April 27, 2015
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Date of Patent
November 7, 2017
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Patent Applicant
ADVANCED ENERGY INDUSTRIES, INC.
ADVANCED ENERGY INDUSTRIES, INC.
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Patent Application Number
14697267
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Patent Citations Received
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US Patent 12132435 Method for repeatable stepper motor homing
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US Patent 12106938 Distortion current mitigation in a radio frequency plasma processing chamber
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US Patent 12112931 Dual reverse pulse sputtering system
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US Patent 12111341 In-situ electric field detection method and apparatus
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US Patent 12125673 Pulsed voltage source for plasma processing applications
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US Patent 11657980 Dielectric fluid variable capacitor
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US Patent 11670488 Fast arc detecting match network
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US Patent 11694876 Apparatus and method for delivering a plurality of waveform signals during plasma processing
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US Patent 11887820 Sector shunts for plasma-based wafer processing systems
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US Patent 11923175 Systems and methods for variable gain tuning of matching networks
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•••
Patent Inventor Names
Douglas Pelleymounter
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Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
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Patent Number
9812305
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Patent Primary Examiner
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Timon Wanga
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