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US Patent 9343330 Compositions for polishing aluminum/copper and titanium in damascene structures

Patent 9343330 was granted and assigned to Cabot Microelectronics (company) on May, 2016 by the United States Patent and Trademark Office.

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Patent abstract

The invention provides a chemical-mechanical polishing composition for polishing a substrate. The polishing composition comprises an oxidizing agent, calcium ion, an organic carboxylic acid, and water, wherein the polishing composition has a pH of about 1.5 to about 7. The invention further provides a method of chemically-mechanically polishing a substrate with the aforementioned polishing composition.

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