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US Patent 9256133 Apparatus and method for developing process

OverviewStructured DataIssuesContributors
Is a
Patent
Patent
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Date Filed
July 13, 2012
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Date of Patent
February 9, 2016
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Patent Application Number
13548557
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Patent Citations Received
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US Patent 12134690 Photoresist composition and method of manufacturing a semiconductor device
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US Patent 12087578 Semiconductor structure and method of forming the same
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US Patent 12087580 Method of manufacturing semiconductor devices
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US Patent 12085855 Resin, photoresist composition, and method of manufacturing semiconductor device
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US Patent 12135502 Resin, photoresist composition, and method of manufacturing semiconductor device
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US Patent 11664213 Bevel edge removal methods, tools, and systems
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US Patent 11662656 Mask and method of forming the same
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US Patent 11694896 Photoresist developer and method of developing photoresist
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US Patent 11705332 Photoresist layer surface treatment, cap layer, and method of forming photoresist pattern
0
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US Patent 11703765 Photoresist composition and method of manufacturing a semiconductor device
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•••
Patent Inventor Names
Ching-Yu Chang
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Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
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Patent Number
9256133
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Patent Primary Examiner
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Daborah Chacko-Davis
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