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US Patent 8884523 Driving at least two high frequency-power generators

OverviewStructured DataIssuesContributorsActivity
Is a
Patent
Patent
Date Filed
November 5, 2007
Date of Patent
November 11, 2014
Patent Application Number
11934901
Patent Citations Received
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US Patent 12125673 Pulsed voltage source for plasma processing applications
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US Patent 11972924 Pulsed voltage source for plasma processing applications
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US Patent 11984306 Plasma chamber and chamber component cleaning methods
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US Patent 12106938 Distortion current mitigation in a radio frequency plasma processing chamber
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US Patent 12111341 In-situ electric field detection method and apparatus
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US Patent 11694876 Apparatus and method for delivering a plurality of waveform signals during plasma processing
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US Patent 11699572 Feedback loop for controlling a pulsed voltage waveform
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US Patent 11776788 Pulsed voltage boost for substrate processing
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US Patent 11776793 Plasma source with ceramic electrode plate
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US Patent 11776789 Plasma processing assembly using pulsed-voltage and radio-frequency power
•••
Patent Inventor Names
Markus Winterhalter
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Ekkehard Mann
0
Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
Patent Number
8884523
Patent Primary Examiner
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Tung X Le

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