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US Patent 8884523 Driving at least two high frequency-power generators

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US Patent 12125673 Pulsed voltage source for plasma processing applications
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US Patent 12111341 In-situ electric field detection method and apparatus
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US Patent 12106938 Distortion current mitigation in a radio frequency plasma processing chamber
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US Patent 11984306 Plasma chamber and chamber component cleaning methods
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US Patent 11972924 Pulsed voltage source for plasma processing applications
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US Patent 11967483 Plasma excitation with ion energy control
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US Patent 11948780 Automatic electrostatic chuck bias compensation during plasma processing
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US Patent 11887813 Pulsed voltage source for plasma processing
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US Patent 11791138 Automatic electrostatic chuck bias compensation during plasma processing
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US Patent 11776789 Plasma processing assembly using pulsed-voltage and radio-frequency power
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US Patent 11776788 Pulsed voltage boost for substrate processing
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US Patent 11776793 Plasma source with ceramic electrode plate
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Patent Inventor Names
Ekkehard Mann0
Markus Winterhalter0
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Official Website
https://pdfpiw.uspto.gov/.piw?Docid=08884523
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US Patent 11699572 Feedback loop for controlling a pulsed voltage waveform
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US Patent 08884523 Driving at least two high frequency-power generators US Patent 8884523 Driving at least two high frequency-power generators

Infobox
Patent Number
08884523
Patent Number
8884523
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Website URL
https://pdfpiw.uspto.gov/.piw?Docid=08884523
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 US Patent 08884523 Driving at least two high frequency-power generators

Infobox
Is a
Patent
Patent
Patent jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
Patent number
08884523
Date of patent
November 11, 2014
Patent application number
11934901
Date Filed
November 5, 2007
Patent primary examiner
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Tung X Le

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