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US Patent 8557712 PECVD flowable dielectric gap fill

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US Patent 12060639 Rapid flush purging during atomic layer deposition
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US Patent 11881411 High pressure annealing process for metal containing materials
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US Patent 11839090 Memory cells separated by a void-free dielectric structure
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US Patent 11756803 Gas delivery system for high pressure processing chamber
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US Patent 11749555 Semiconductor processing system
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US Patent 11746420 PECVD apparatus for in-situ deposition of film stacks
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US Patent 11705337 Tungsten defluorination by high pressure treatment
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US Patent 11694912 High pressure and high temperature anneal chamber
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US Patent 08557712 PECVD flowable dielectric gap fill US Patent 8557712 PECVD flowable dielectric gap fill

Infobox
Patent Number
0855771200
Patent Number
855771200
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Infobox
Is a
Patent
Patent
0
Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
0
Patent Number
085577120
Date of Patent
October 15, 2013
0
Patent Application Number
123347260
Date Filed
December 15, 2008
0
Patent Primary Examiner
‌
Julio J Maldonado
0
Edits on 27 Sep, 2022
"Entity importer update"
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edited on 27 Sep, 2022
Infobox
Is a
Patent
Patent
0
Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
0
Patent Number
085577120
Date of Patent
October 15, 2013
0
Patent Application Number
123347260
Date Filed
December 15, 2008
0
Patent Primary Examiner
‌
Julio J Maldonado
0
Edits on 18 Dec, 2021
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created this topic on 18 Dec, 2021
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Infobox (+7 properties)
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 US Patent 08557712 PECVD flowable dielectric gap fill

Infobox
Is a
Patent
Patent
Patent jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
Patent number
08557712
Date of patent
October 15, 2013
Patent application number
12334726
Date Filed
December 15, 2008
Patent primary examiner
‌
Julio J Maldonado

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