Is a
Patent attributes
Current Assignee
Patent Jurisdiction
Patent Number
Date of Patent
August 16, 2011
Patent Application Number
11150944
Date Filed
June 13, 2005
Patent Citations Received
...
Patent Primary Examiner
Patent abstract
The invention relates to a method of polishing a substrate comprising at least one metal layer by applying an electrochemical potential between the substrate and at least one electrode in contact with a polishing composition comprising a reducing agent or an oxidizing agent.
Timeline
No Timeline data yet.
Further Resources
No Further Resources data yet.
