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US Patent 7929261 Suppressing arc discharges
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Patent
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Date Filed
March 7, 2008
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Date of Patent
April 19, 2011
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Patent Application Number
12044338
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Patent Citations Received
US Patent 12125673 Pulsed voltage source for plasma processing applications
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US Patent 11984306 Plasma chamber and chamber component cleaning methods
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US Patent 12106938 Distortion current mitigation in a radio frequency plasma processing chamber
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US Patent 12111341 In-situ electric field detection method and apparatus
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US Patent 11776788 Pulsed voltage boost for substrate processing
US Patent 11776789 Plasma processing assembly using pulsed-voltage and radio-frequency power
US Patent 11791138 Automatic electrostatic chuck bias compensation during plasma processing
US Patent 11887813 Pulsed voltage source for plasma processing
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US Patent 11948780 Automatic electrostatic chuck bias compensation during plasma processing
0
US Patent 11967483 Plasma excitation with ion energy control
0
•••
Patent Inventor Names
Peter Wiedemuth
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Patent Jurisdiction
United States Patent and Trademark Office
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Patent Number
7929261
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Patent Primary Examiner
Ronald W. Leja
0
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