Patent attributes
For suppressing arc discharges in a plasma process, a method includes monitoring of at least one parameter of the plasma process, determining a temporal feature of a first countermeasure and performing the first countermeasure. The temporal feature is determined as a function of, for example, at least one of an interval in time from at least one previous countermeasure, a development of the at least one parameter since a relevant time of introduction of the countermeasure, or since a variable period of time ahead of the relevant time of introduction of the countermeasure, and a differentiation as to whether a previous countermeasure was triggered based on the behavior of the at least one parameter, or based on the interval in time from at least one previous countermeasure.
