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US Patent 7408329 Power supply unit for gas discharge processes

OverviewStructured DataIssuesContributorsActivity
Is a
Patent
Patent
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Date Filed
September 15, 2005
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Date of Patent
August 5, 2008
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Patent Application Number
11226473
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Patent Citations Received
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US Patent 12125673 Pulsed voltage source for plasma processing applications
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US Patent 11948780 Automatic electrostatic chuck bias compensation during plasma processing
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US Patent 11967483 Plasma excitation with ion energy control
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US Patent 11972924 Pulsed voltage source for plasma processing applications
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US Patent 12106938 Distortion current mitigation in a radio frequency plasma processing chamber
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US Patent 12111341 In-situ electric field detection method and apparatus
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US Patent 11699572 Feedback loop for controlling a pulsed voltage waveform
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US Patent 11776788 Pulsed voltage boost for substrate processing
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US Patent 11776789 Plasma processing assembly using pulsed-voltage and radio-frequency power
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US Patent 11791138 Automatic electrostatic chuck bias compensation during plasma processing
•••
Patent Inventor Names
Markus Winterhalter
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Peter Wiedemuth
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Stefan Schirmaier
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Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
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Patent Number
7408329
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Patent Primary Examiner
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Tuyet Vo
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