US Patent 7329170 Method of producing polishing pad
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Patent abstract
A method of producing a polishing pad having a polishing layer is characterized in that the polishing layer is produced by a photolithographic method including: forming a sheet molding from a curing composition containing at least an initiator and an energy ray-reactive compound to be cured with energy rays; exposing the sheet molding to energy rays to induce modification thereof, to change the solubility of the sheet molding in a solvent; and developing the sheet molding after irradiation with energy rays, to partially remove the curing composition with a solvent thereby forming a concave and convex pattern at least one surface.
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US Patent 07329170 Method of producing polishing pad US Patent 7329170 Method of producing polishing pad
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Patent Number
0732917000
Patent Number
732917000
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Patent Jurisdiction
Patent Number
073291700
Date of Patent
February 12, 2008
0Patent Application Number
113662380
Date Filed
March 2, 2006
0Official Website
Patent Primary Examiner
Edits on 25 Sep, 2022
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Infobox
Is a
Patent Jurisdiction
Patent Number
073291700
Date of Patent
February 12, 2008
0Patent Application Number
113662380
Date Filed
March 2, 2006
0Official Website
Patent Primary Examiner
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US Patent 07329170 Method of producing polishing pad
Infobox
Is a
Patent jurisdiction
Patent number
07329170
Date of patent
February 12, 2008
Patent application number
11366238
Date Filed
March 2, 2006
Patent primary examiner
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