Is a
Patent attributes
Patent Jurisdiction
Patent Number
Date of Patent
February 12, 2008
Patent Application Number
11366238
Date Filed
March 2, 2006
Patent Citations Received
Patent Primary Examiner
Patent abstract
A method of producing a polishing pad having a polishing layer is characterized in that the polishing layer is produced by a photolithographic method including: forming a sheet molding from a curing composition containing at least an initiator and an energy ray-reactive compound to be cured with energy rays; exposing the sheet molding to energy rays to induce modification thereof, to change the solubility of the sheet molding in a solvent; and developing the sheet molding after irradiation with energy rays, to partially remove the curing composition with a solvent thereby forming a concave and convex pattern at least one surface.
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