US Patent 11984296 Substrate support with improved process uniformity
Patent 11984296 was granted and assigned to Lam Research on May, 2024 by the United States Patent and Trademark Office.
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US Patent 11984296 Substrate support with improved process uniformity
Article
Patent abstract
A substrate support for supporting a substrate in a substrate processing system includes a baseplate and a ceramic layer arranged above the baseplate. An outer perimeter of the ceramic layer is surrounded by an edge ring. An outer radius of the ceramic layer is greater than an inner radius of the edge ring such that an outer edge of the ceramic layer extends below the edge ring.
Infobox
Is a
Patent Applicant
Current Assignee
Patent Jurisdiction
Patent Number
Patent Inventor Names
Fangli Hao0
Yuehong Fu0
Zhigang Chen0
Date of Patent
May 14, 2024
0Patent Application Number
171513660
Date Filed
January 18, 2021
0Patent Citations
Patent Primary Examiner
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