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US Patent 11168410 Susceptor for a chemical vapour deposition reactor

Patent 11168410 was granted and assigned to Aixtron on November, 2021 by the United States Patent and Trademark Office.

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Patent
Patent
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Patent attributes

Patent Applicant
Aixtron
Aixtron
0
Current Assignee
Aixtron
Aixtron
0
Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
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Patent Number
111684100
Patent Inventor Names
Daniel Claessens0
Adam Boyd0
James O'Dowd0
Olivier Feron0
Date of Patent
November 9, 2021
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Patent Application Number
201708220
Date Filed
August 22, 2017
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Patent Citations Received
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US Patent 11984296 Substrate support with improved process uniformity
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Patent Primary Examiner
‌
Charlee J. C. Bennett
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Patent abstract

A susceptor for a CVD-reactor includes insertion openings arranged in a bearing surface of the susceptor. An insertion section of a positioning element is inserted into one of the insertion openings. The insertion section forms positioning flanks with a section projecting from the insertion opening for fixing the position of a substrate. The insertion openings each have side walls and a base. The insertion section comprises bearing areas adjacent to the side walls of the insertion openings and a lower side of the positioning element facing the base of the insertion opening. The base of the insertion opening is separated from the lower side of the positioning element by a first distance. An edge protruding section of the positioning element is separated from a section of the bearing surface of the susceptor by a second distance.

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