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US Patent 11981833 Polishing composition for semiconductor wiring

Patent 11981833 was granted and assigned to Daicel on May, 2024 by the United States Patent and Trademark Office.

OverviewStructured DataIssuesContributors
Is a
Patent
Patent
0
Current Assignee
Daicel
Daicel
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Date Filed
March 18, 2020
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Date of Patent
May 14, 2024
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Patent Applicant
Daicel
Daicel
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Patent Application Number
17262088
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Patent Citations
‌
US Patent 10844334 Composition for removing resist
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US Patent 7459398 Slurry for CMP, polishing method and method of manufacturing semiconductor device
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US Patent 8273921 Polyglycerol monoether and process for producing the same
0
‌
US Patent 9346977 Abrasive, abrasive set, and method for abrading substrate
0
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US Patent 10196542 Abrasive, abrasive set, and method for abrading substrate
0
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US Patent 10466592 Agent for resist hydrophilization treatment
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Patent Inventor Names
Yuichi Sakanishi
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Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
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Patent Number
11981833
0
Patent Primary Examiner
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James A Fiorito
0
CPC Code
‌
C09G 1/02
0

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