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US Patent 11978655 Substrate transfer mechanism and substrate transferring method

Patent 11978655 was granted and assigned to Tokyo Electron on May, 2024 by the United States Patent and Trademark Office.

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Contents

Is a
Patent
Patent
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Patent attributes

Patent Applicant
Tokyo Electron
Tokyo Electron
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Current Assignee
Tokyo Electron
Tokyo Electron
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Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
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Patent Number
119786550
Patent Inventor Names
Kousei Ide0
Naruaki Iida0
Date of Patent
May 7, 2024
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Patent Application Number
182012700
Date Filed
May 24, 2023
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Patent Citations
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US Patent 10083851 Robot with inner and outer belt sections
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US Patent 7819658 Heat treatment system and method therefore
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US Patent 8441618 Substrate transfer method and apparatus
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US Patent 8655429 Robotic arm for a radiation treatment system
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US Patent 9184071 Multi-story substrate treating apparatus with flexible transport mechanisms and vertically divided treating units
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US Patent 11065760 Multiaxial robot with cover
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Patent Primary Examiner
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Gerald McClain
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CPC Code
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B25J 9/043
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H01L 21/67712
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H01L 21/68707
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H01L 21/67178
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B25J 9/042
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Patent abstract

A substrate transfer mechanism includes: an arm base main body provided with a first driver; a lift configured to move up and down the arm base main body; a first arm extending transversely from a lower side of the arm base main body, and having a tip end that pivots around a vertical axis with respect to the arm base main body by the first driver; a second arm extending transversely from an upper side of the tip end of the first arm, and having a tip end that pivots around a vertical axis with respect to the first arm along with the pivoting of the first arm; and a substrate holder provided on an upper side of the tip end of the second arm, and configured to rotate around a vertical axis with respect to the second arm.

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