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US Patent 11715777 Semiconductor device and method

OverviewStructured DataIssuesContributorsActivity
Is a
Patent
Patent
0
Date Filed
May 29, 2020
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Date of Patent
August 1, 2023
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Patent Application Number
16887219
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Patent Citations
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US Patent 9536738 Vertical gate all around (VGAA) devices and methods of manufacturing the same
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US Patent 9576814 Method of spacer patterning to form a target integrated circuit pattern
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US Patent 9608116 FINFETs with wrap-around silicide and method forming the same
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US Patent 10236217 Stacked field-effect transistors (FETs) with shared and non-shared gates
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US Patent 10461078 Creating devices with multiple threshold voltage by cut-metal-gate process
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US Patent 9412828 Aligned gate-all-around structure
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US Patent 9472618 Nanowire field effect transistor device having a replacement gate
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US Patent 9502265 Vertical gate all around (VGAA) transistors and methods of forming the same
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US Patent 9520482 Method of cutting metal gate
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US Patent 9209247 Self-aligned wrapped-around structure
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•••
Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
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Patent Number
11715777
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Patent Primary Examiner
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Mary A Wilczewski
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CPC Code
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H01L 29/165
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H01L 29/41766
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H01L 29/78696
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H01L 29/66636
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H01L 29/7848
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H01L 23/485
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B82Y 10/00
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H01L 29/775
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H01L 29/42372
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H01L 29/785
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•••

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