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US Patent 11704463 Method of etch model calibration using optical scatterometry

Patent 11704463 was granted and assigned to Lam Research on July, 2023 by the United States Patent and Trademark Office.

OverviewStructured DataIssuesContributors
Is a
Patent
Patent
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Current Assignee
Lam Research
Lam Research
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Date Filed
March 31, 2021
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Date of Patent
July 18, 2023
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Patent Applicant
Lam Research
Lam Research
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Patent Application Number
17301345
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Patent Citations
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US Patent 7739651 Method and apparatus to determine if a pattern is robustly manufacturable
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US Patent 7812966 Method of determining the depth profile of a surface structure and system for determining the depth profile of a surface structure
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US Patent 7849423 Method of verifying photomask data based on models of etch and lithography processes
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US Patent 7921383 Photolithographic process simulation including efficient result computation for multiple process variation values
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US Patent 7962867 Electronic design for integrated circuits based on process related variations
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US Patent 7967995 Multi-layer/multi-input/multi-output (MLMIMO) models and method for using
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US Patent 8001512 Method and system for implementing context simulation
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US Patent 8102408 Computer-implemented methods and systems for determining different process windows for a wafer printing process for different reticle designs
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US Patent 8279409 System and method for calibrating a lithography model
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US Patent 8832610 Method for process window optimized optical proximity correction
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•••
Patent Citations Received
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US Patent 11921433 Optical metrology in machine learning to characterize features
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Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
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Patent Number
11704463
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Patent Primary Examiner
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Bryce M Aisaka
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