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US Patent 7967995 Multi-layer/multi-input/multi-output (MLMIMO) models and method for using

Patent 7967995 was granted and assigned to Tokyo Electron on June, 2011 by the United States Patent and Trademark Office.

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Patent
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Current Assignee
Tokyo Electron
Tokyo Electron
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Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
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Patent Number
79679950
Patent Inventor Names
Hyung Joo Lee0
Radha Sundararajan0
Asao Yamashita0
Daniel Prager0
Merritt Funk0
Date of Patent
June 28, 2011
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Patent Application Number
120596240
Date Filed
March 31, 2008
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Patent Citations Received
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US Patent 11704463 Method of etch model calibration using optical scatterometry
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US Patent 11921433 Optical metrology in machine learning to characterize features
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Patent Primary Examiner
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Allan Olsen
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Patent abstract

The invention provides a method of processing a substrate using multilayer processing sequences and Multi-Layer/Multi-Input/Multi-Output (MLMIMO) models and libraries that can include one or more masking layer creation procedures, one or more pre-processing measurement procedures, one or more Partial-Etch (P-E) procedures, one or more Final-Etch (F-E) procedures, and one or more post-processing measurement procedures.

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