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US Patent 8279409 System and method for calibrating a lithography model

Patent 8279409 was granted and assigned to Cadence Design Systems on October, 2012 by the United States Patent and Trademark Office.

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Is a

Patent

Patent attributes

Current Assignee

Cadence Design Systems

Patent Jurisdiction

United States Patent and Trademark Office

Patent Number

82794090

Patent Inventor Names

Tatung Chow0

Abdurrahman Sezginer0

Gokhan Percin0

Hsu-Ting Huang0

Jesus Orsely Carrero0

Kostyantyn Chuyeshov0

Date of Patent

October 2, 2012

Patent Application Number

125364250

Date Filed

August 5, 2009

Patent Citations Received

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US Patent 12093632 Machine learning based inverse optical proximity correction and process model calibration

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US Patent 11704463 Method of etch model calibration using optical scatterometry

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US Patent 11921433 Optical metrology in machine learning to characterize features

Patent Primary Examiner

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Hung Henry Nguyen

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