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US Patent 11688786 Semiconductor device and method

OverviewStructured DataIssuesContributorsActivity
Is a
Patent
Patent
0
Date Filed
March 2, 2021
0
Date of Patent
June 27, 2023
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Patent Application Number
17189779
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Patent Citations
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US Patent 9991357 Semiconductor devices with gate electrodes on separate sets of high-k dielectric layers
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US Patent 10461167 Semiconductor device and method of manufacturing the same
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US Patent 9412817 Silicide regions in vertical gate all around (VGAA) devices and methods of forming same
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US Patent 9412828 Aligned gate-all-around structure
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US Patent 9472618 Nanowire field effect transistor device having a replacement gate
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US Patent 9502265 Vertical gate all around (VGAA) transistors and methods of forming the same
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US Patent 9576814 Method of spacer patterning to form a target integrated circuit pattern
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US Patent 9608116 FINFETs with wrap-around silicide and method forming the same
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Patent Citations Received
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US Patent 12068386 Semiconductor devices and methods of forming the same
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Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
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Patent Number
11688786
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Patent Primary Examiner
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Tong-Ho Kim
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CPC Code
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H01L 21/28088
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H01L 21/28518
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H01L 21/823807
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H01L 21/823814
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H01L 21/823842
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H01L 21/823864
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H01L 21/823871
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H01L 27/092
0
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H01L 29/0673
0
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H01L 29/4908
0
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