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US Patent 11643720 Selective deposition of silicon oxide on metal surfaces
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Patent
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Date Filed
March 29, 2021
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Date of Patent
May 9, 2023
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Patent Application Number
17216249
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Patent Citations
US Patent 10047435 Dual selective deposition
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US Patent 10049924 Selective formation of metallic films on metallic surfaces
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US Patent 10115603 Removal of surface passivation
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US Patent 10157786 Selective formation of metallic films on metallic surfaces
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US Patent 10186420 Formation of silicon-containing thin films
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US Patent 10204782 Combined anneal and selective deposition process
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US Patent 10343186 Vapor phase deposition of organic films
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US Patent 10373820 Deposition of organic films
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US Patent 10428421 Selective deposition on metal or metallic surfaces relative to dielectric surfaces
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US Patent 10443123 Dual selective deposition
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Patent Inventor Names
Shaoren Deng
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Andrea Illiberi
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Daniele Chiappe
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Eva Tois
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Giuseppe Alessio Verni
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Marko Tuominen
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Michael Givens
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Patent Jurisdiction
United States Patent and Trademark Office
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Patent Number
11643720
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Patent Primary Examiner
Elizabeth A Burkhart
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CPC Code
C23C 16/45553
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C23C 16/45525
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C23C 16/401
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C23C 16/45534
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