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US Patent 11525184 Dual selective deposition

Overview Structured Data Issues Contributors

Is a

Date Filed

May 27, 2021

Date of Patent

December 13, 2022

Patent Application Number

17331971

Patent Citations

US Patent 10047435 Dual selective deposition

US Patent 10049924 Selective formation of metallic films on metallic surfaces

US Patent 10115603 Removal of surface passivation

US Patent 10157786 Selective formation of metallic films on metallic surfaces

US Patent 10186420 Formation of silicon-containing thin films

US Patent 10204782 Combined anneal and selective deposition process

US Patent 10343186 Vapor phase deposition of organic films

US Patent 10373820 Deposition of organic films

US Patent 10428421 Selective deposition on metal or metallic surfaces relative to dielectric surfaces

US Patent 10443123 Dual selective deposition

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Patent Jurisdiction

United States Patent and Trademark Office

Patent Number

Patent Primary Examiner

Elizabeth A Burkhart

CPC Code

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