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US Patent 11348762 High-frequency power supply system

OverviewStructured DataIssuesContributorsActivity
Is a
Patent
Patent
Date Filed
December 18, 2020
Date of Patent
May 31, 2022
Patent Application Number
17126889
Patent Citations
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US Patent 10340879 Switching circuit
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US Patent 10431424 Parasitic capacitance compensation circuit
0
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US Patent 10431428 System for providing variable capacitance
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US Patent 10454453 RF impedance matching network
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US Patent 10455729 Enclosure cooling system
0
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US Patent 10460912 RF impedance matching circuit and systems and methods incorporating same
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US Patent 10707057 RF impedance matching circuit and systems and methods incorporating same
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US Patent 10483090 Restricted capacitor switching
0
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US Patent 10727029 Impedance matching using independent capacitance and frequency control
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US Patent 10026594 RF impedance matching network
•••
Patent Citations Received
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US Patent 11978612 Plasma processing apparatus
0
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US Patent 11784030 Plasma processing apparatus
Patent Inventor Names
Tatsuya Morii
0
Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
Patent Number
11348762
Patent Primary Examiner
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Henry Luong
CPC Code
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H01J 37/32183

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