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US Patent 11784030 Plasma processing apparatus

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Contents

Is a
Patent
Patent

Patent attributes

Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
Patent Number
11784030
Patent Inventor Names
Atsushi Takeda
Nobuaki Tsuchiya
Tadashi Inoue
Takayuki Moriwaki
Kazunari Sekiya
Hiroshi Sasamoto
Tatsunori Sato
Masaharu Tanabe
Date of Patent
October 10, 2023
Patent Application Number
17932400
Date Filed
September 15, 2022
Patent Citations
‌
US Patent 8647585 Microwave plasma sterilisation system and applicators therefor
‌
US Patent 10553406 Plasma generating apparatus and substrate processing apparatus
‌
US Patent 10685810 RF antenna producing a uniform near-field Poynting vector
‌
US Patent 10879043 Device intrinsically designed to resonate, suitable for RF power transfer as well as group including such device and usable for the production of plasma
‌
US Patent 11013075 RF apparatus with arc prevention using non-linear devices
‌
US Patent 11114287 Radical output monitor for a remote plasma source and method of use
‌
US Patent 11170991 Plasma processing apparatus
‌
US Patent 11315765 Plasma processing apparatus and plasma processing method
...
Patent Primary Examiner
‌
Srinivas Sathiraju
Patent abstract

A plasma processing apparatus includes a balun having a first unbalanced terminal, a second unbalanced terminal, a first balanced terminal, and a second balanced terminal, a grounded vacuum container, a first electrode electrically connected to the first balanced terminal, a second electrode electrically connected to the second balanced terminal, and a ground electrode arranged in the vacuum container and grounded.

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