US Patent 11306393 Methods and apparatus for ALD processes
Patent 11306393 was granted and assigned to Applied Materials on April, 2022 by the United States Patent and Trademark Office.
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Chien-Teh Kao0
Jeffrey A. Kho0
Jianhua Zhou0
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US Patent 11306393 Methods and apparatus for ALD processes
Article
The present disclosure relates to methods and apparatus for an atomic layer deposition (ALD) chamber. In one embodiment, a lid assembly is provided that includes a multi-channel showerhead having a plurality of first gas channels and a plurality of second gas channels that are fluidly isolated from each of the first gas channels, and a flow guide coupled to opposing sides of the multi-channel showerhead, each of the flow guides being fluidly coupled to the plurality of second gas channels.
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Patent number
11306393
Date of patent
April 19, 2022
Patent application number
16517255
Date Filed
July 19, 2019
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