Is a
Patent attributes
Patent Applicant
Current Assignee
Patent Jurisdiction
Patent Number
Patent Inventor Names
Chien-Teh Kao0
Jeffrey A. Kho0
Jianhua Zhou0
Date of Patent
April 19, 2022
Patent Application Number
16517255
Date Filed
July 19, 2019
Patent Citations
Patent Primary Examiner
The present disclosure relates to methods and apparatus for an atomic layer deposition (ALD) chamber. In one embodiment, a lid assembly is provided that includes a multi-channel showerhead having a plurality of first gas channels and a plurality of second gas channels that are fluidly isolated from each of the first gas channels, and a flow guide coupled to opposing sides of the multi-channel showerhead, each of the flow guides being fluidly coupled to the plurality of second gas channels.
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