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US Patent 11011503 Direct-bonded optoelectronic interconnect for high-density integrated photonics
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Is a
Patent
Date Filed
December 13, 2018
Date of Patent
May 18, 2021
Patent Application Number
16219693
Patent Citations
US Patent 10026605 Method of reducing residual contamination in singulated semiconductor die
US Patent 10276619 Semiconductor device structure with a conductive feature passing through a passivation layer
US Patent 10269756 Die processing
US Patent 10075657 Edgeless large area camera system
Patent Citations Received
US Patent 12136605 Layer structures for making direct metal-to-metal bonds at low temperatures in microelectronics and method for forming the same
0
US Patent 12125784 Interconnect structures
0
US Patent 12132020 Low temperature bonded structures
0
US Patent 11459123 Method for assembling at least two parts by transparent welding, method for assembling a primary structure of an aircraft pylon by transparent welding, primary structure of an aircraft pylon thus obtained and aircraft comprising said primary structure
US Patent 11621246 Diffused bitline replacement in stacked wafer memory
US Patent 11626363 Bonded structures with integrated passive component
US Patent 11631586 Heterogeneous annealing method
US Patent 11631647 Integrated device packages with integrated device die and dummy element
US Patent 11652083 Processed stacked dies
0
US Patent 11658173 Stacked dies and methods for forming bonded structures
0
•••
Patent Jurisdiction
United States Patent and Trademark Office
Patent Number
11011503
Patent Primary Examiner
S. V. Clark
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