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US Patent 10885258 Fixing ESD path resistance errors in circuit design layout

Patent 10885258 was granted and assigned to Synopsys on January, 2021 by the United States Patent and Trademark Office.

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Contents

Is a
Patent
Patent
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Patent attributes

Patent Applicant
Synopsys
Synopsys
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Current Assignee
Synopsys
Synopsys
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Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
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Patent Number
108852580
Patent Inventor Names
De-Shiuan Chiou0
Date of Patent
January 5, 2021
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Patent Application Number
165763150
Date Filed
September 19, 2019
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Patent Citations
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US Patent 10055533 Visualization of analysis process parameters for layout-based checks
Patent Citations Received
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US Patent 12093619 Automated circuit generation
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US Patent 12008296 Automated circuit generation
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US Patent 12073157 Automated circuit generation
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US Patent 12079555 Automated circuit generation
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US Patent 12093618 Automated circuit generation
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US Patent 11694007 Automated circuit generation
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US Patent 11354471 Automated circuit generation
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US Patent 11354472 Automated circuit generation
...
Patent Primary Examiner
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Phallaka Kik
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Patent abstract

A physical verification tool for debugging ESD ground path resistance violations in ESD protection circuits. The ESD ground path is modeled and partitioned into component path structures (polygons) that are disposed in associated design layers. A total ESD ground path resistance is then calculated and compared with a maximum allowable resistance value defined by an ESD protection rule. When the ESD ground path is non-compliant, a resistance contribution ratio is determined for each polygon and/or for each layer, for example, by applying nodal analysis to the ESD ground path model. Resistance contribution ratios are then calculated for each polygon and/or for each layer, and most-problematic polygons and/or layers are identified by way of having the highest resistance contribution ratio values. A report (e.g., a table or graphical visualization) is then generated that prioritizes or emphasizes (e.g., by way of a bolder contrast or brighter color) the most-problematic layer and/or polygon.

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