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US Patent 10714315 Semiconductor reaction chamber showerhead

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Edits on 30 Jul, 2023

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Patent Citations Received

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US Patent 11447866 High temperature chemical vapor deposition lid

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edited on 25 May, 2023

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Official Website

https://pdfpiw.uspto.gov/.piw?Docid=10714315

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Patent Citations

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US Patent 10186420 Formation of silicon-containing thin films

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Patent Citations

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US Patent 10276355 Multi-zone reactor, system including the reactor, and method of using the same

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US Patent 10018920 Lithography patterning with a gas phase resist

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US Patent 10087522 Deposition of metal borides

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US Patent 10179947 Method for forming conformal nitrided, oxidized, or carbonized dielectric film by atomic layer deposition

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US Patent 10047435 Dual selective deposition

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US Patent 10134757 Method of processing a substrate and a device manufactured by using the method

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Patent Citations

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US Patent 10106892 Thermal oxide equivalent low temperature ALD oxide for dual purpose gate oxide and method for producing the same

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US Patent 10060473 Energy conversion systems and methods

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US Patent 10269558 Method of forming a structure on a substrate

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US Patent 10395917 Si precursors for deposition of SiN at low temperatures

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US Patent 10177025 Method and apparatus for filling a gap

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US Patent 10229833 Methods for forming a transition metal nitride film on a substrate by atomic layer deposition and related semiconductor device structures

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US Patent 10090316 3D stacked multilayer semiconductor memory using doped select transistor channel

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US Patent 10343920 Aligned carbon nanotubes

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US Patent 10290508 Method for forming vertical spacers for spacer-defined patterning

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US Patent 10319588 Method for depositing a metal chalcogenide on a substrate by cyclical deposition

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edited on 24 Mar, 2023

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Patent Citations

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US Patent 10103040 Apparatus and method for manufacturing a semiconductor device

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