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US Patent 10662525 Thin film deposition apparatus
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Patent
Date Filed
July 5, 2016
Date of Patent
May 26, 2020
Patent Application Number
15202468
Patent Citations Received
US Patent 11286558 Methods for depositing a molybdenum nitride film on a surface of a substrate by a cyclical deposition process and related semiconductor device structures including a molybdenum nitride film
US Patent 11295980 Methods for depositing a molybdenum metal film over a dielectric surface of a substrate by a cyclical deposition process and related semiconductor device structures
US Patent D947913 Susceptor shaft
US Patent 11450529 Methods for selectively forming a target film on a substrate comprising a first dielectric surface and a second metallic surface
US Patent 11296189 Method for depositing a phosphorus doped silicon arsenide film and related semiconductor device structures
US Patent 11274369 Thin film deposition method
Patent Jurisdiction
United States Patent and Trademark Office
Patent Number
10662525
Patent Primary Examiner
Matthew J Song
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