Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Arie Jeffrey Den Boef0
Adrianus Johannes Hendrikus Schellekens0
Alessandro Polo0
Simon Gijsbert Josephus Mathijssen0
Simon Reinald Huisman0
Willem Marie Julia Marcel Coene0
Elahe Yeganegi Dastgerdi0
Erik Willem Bogaart0
...
Date of Patent
March 10, 2020
0Patent Application Number
155750690
Date Filed
March 14, 2016
0Patent Citations Received
Patent Primary Examiner
Patent abstract
An alignment system, method and lithographic apparatus are provided for determining the position of an alignment mark, the alignment system comprising a first system configured to produce two overlapping images of the alignment mark that are rotated by around 180 degrees with respect to one another, and a second system configured to determine the position of the alignment mark from a spatial distribution of an intensity of the two overlapping images.
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