US Patent 10069443 Dechuck control method and plasma processing apparatus
Patent 10069443 was granted and assigned to Tokyo Electron on September, 2018 by the United States Patent and Trademark Office.
Is a
Current Assignee
Date Filed
December 19, 2012
Date of Patent
September 4, 2018
Patent Applicant
Patent Application Number
13719509
Patent Citations Received
Patent Jurisdiction
Patent Number
Patent Primary Examiner
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