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Mattson Technology

Mattson Technology is a Fremont, California-based company founded in 1988 by Brad Mattson.

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Edits on 2 Jan, 2024
"Infobox creation from: Wikidata data enrichment"
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Golden AI
approved a suggestion from Golden's AI on 2 Jan, 2024
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Infobox (+1 properties)
Infobox
Parent Organization
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Beijing E-Town
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"NL fact extraction"
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edited on 2 Jan, 2024
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Founded Date
January 1, 1988
B2X
B2B
B2B
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Founded Date
1988
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Number of Employees (Ranges)
501 – 1,0000
Edits on 6 May, 2023
"Covert AngelList URL to Wellfound ID"
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Golden AI
edited on 6 May, 2023
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Infobox (+1 properties)
Infobox
Wellfound ID
mattson-technology-1
Edits on 15 Aug, 2022
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B.R WON
edited on 15 Aug, 2022
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Infobox (+2 properties)
Infobox
Crunchbase URL
https://www.crunchbase.com/organization/mattson-technology
Pitchbook URL
https://pitchbook.com/profiles/company/41092-12
Edits on 10 Jun, 2022
"Entity importer update"
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edited on 10 Jun, 2022
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Is a
Organization
Organization
Edits on 30 May, 2022
"Edit from table cell"
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Ольга Дрокина
edited on 30 May, 2022
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Company Operating Status
Active
Edits on 8 Apr, 2022
"Patent autocalculation"
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edited on 8 Apr, 2022
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Patents assigned (count)
92
Edits on 14 Dec, 2021
"Remove inverse infobox"
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Golden AI
edited on 14 Dec, 2021
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Infobox (-36 properties)
Infobox
Patents
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US Patent 7101812 Method of forming and/or modifying a dielectric film on a semiconductor surface
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US Patent 7115837 Selective reflectivity process chamber with customized wavelength response and method
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US Patent 7135656 Apparatus and method for reducing stray light in substrate processing chambers
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US Patent 7176417 Apparatuses and methods for resistively heating a thermal processing system
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US Patent 7184657 Enhanced rapid thermal processing apparatus and method
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US Patent 7226488 Fast heating and cooling apparatus for semiconductor wafers
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US Patent 7232767 Slotted electrostatic shield modification for improved etch and CVD process uniformity
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US Patent 7269343 Heating configuration for use in thermal processing chambers
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US Patent 7276122 Multi-workpiece processing chamber
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US Patent 7316969 Method and apparatus for thermally treating substrates
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US Patent 7317870 Pulsed processing semiconductor heating methods using combinations of heating sources
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US Patent 7358462 Apparatus and method for reducing stray light in substrate processing chambers
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US Patent 7361605 System and method for removal of photoresist and residues following contact etch with a stop layer present
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US Patent 7398014 Enhanced rapid thermal processing apparatus and method
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US Patent 7453051 System and process for heating semiconductor wafers by optimizing absorption of electromagnetic energy
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US Patent 7528348 Apparatus and method for measuring the temperature of substrates
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US Patent 7543981 Methods for determining wafer temperature
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US Patent 7561258 Wafer tilt detection apparatus and method
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US Patent 7563068 Low cost high throughput processing platform
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US Patent 7608802 Heating device for heating semiconductor wafers in thermal processing chambers
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US Patent 7642205 Rapid thermal processing using energy transfer layers
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US Patent 7654596 Endeffectors for handling semiconductor wafers
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US Patent 7658586 Advanced low cost high throughput processing platform
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US Patent 7704898 Method for the thermal treatment of disk-shaped substrates
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US Patent 7734439 System and process for calibrating pyrometers in thermal processing chambers
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US Patent 7737385 Selective reflectivity process chamber with customized wavelength response and method
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US Patent 7745762 Optimizing the thermal budget during a pulsed heating process
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US Patent 7799685 System and method for removal of photoresist in transistor fabrication for integrated circuit manufacturing
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US Patent 7847218 System and process for heating semiconductor wafers by optimizing absorption of electromagnetic energy
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US Patent 7947605 Post ion implant photoresist strip using a pattern fill and method
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US Patent 7949237 Heating configuration for use in thermal processing chambers
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US Patent 7957926 System and process for calibrating pyrometers in thermal processing chambers
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US Patent 7972444 Workpiece support with fluid zones for temperature control
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US Patent 7976216 Determining the temperature of silicon at high temperatures
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US Patent 7977258 Method and system for thermally processing a plurality of wafer-shaped objects
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US Patent 8000587 Pulsed processing semiconductor heating methods and associated system using combinations of heating sources
Edits on 8 Dec, 2021
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edited on 8 Dec, 2021
Edits on 8 Dec, 2021
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edited on 8 Dec, 2021
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Golden AI
edited on 8 Dec, 2021
Edits made to:
Infobox (+1 properties)
Infobox
Patents
‌
US Patent 7976216 Determining the temperature of silicon at high temperatures
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Golden AI
edited on 8 Dec, 2021
Edits made to:
Infobox (+1 properties)
Infobox
Patents
‌
US Patent 7972444 Workpiece support with fluid zones for temperature control
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Golden AI
edited on 7 Dec, 2021
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Golden AI
edited on 7 Dec, 2021
Edits made to:
Infobox (+1 properties)
Infobox
Patents
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US Patent 7949237 Heating configuration for use in thermal processing chambers
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Golden AI
edited on 7 Dec, 2021
Edits on 6 Dec, 2021
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edited on 6 Dec, 2021
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edited on 4 Dec, 2021

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