Jeffrie R. Lund

US Patent 7087119 Atomic layer deposition with point of use generated reactive gas species

US Patent 7105059 Reaction apparatus for atomic layer deposition

US Patent 7105060 Method of forming an oxidation-resistant TiSiN film

US Patent 7108753 Staggered ribs on process chamber to reduce thermal effects

US Patent 11177131 Method and apparatuses for reducing porogen accumulation from a UV-cure chamber

US Patent 7147718 Device and method for the deposition of, in particular, crystalline layers on, in particular, crystalline substrates

US Patent 7156922 Multi-chamber installation for treating objects under vacuum, method for evacuating said installation and evacuation system therefor

US Patent 7156923 Silicon nitride film forming method, silicon nitride film forming system and silicon nitride film forming system precleaning method

US Patent 7159537 Device for fixing a gas showerhead or target plate to an electrode in plasma processing systems

US Patent 7160393 Vacuum chamber assembly

US Patent 7166170 Cylinder-based plasma processing system

US Patent 7169231 Gas distribution system with tuning gas

US Patent 7172674 Device for liquid treatment of wafer-shaped articles

US Patent 7179397 Plasma processing methods and apparatus

US Patent 7182817 Apparatus and method for developing latent fingerprints

US Patent 7192486 Clog-resistant gas delivery system

US Patent 7204885 Deposition system to provide preheating of chemical vapor deposition precursors

US Patent 7217326 Chemical vapor deposition apparatus

US Patent 7217336 Directed gas injection apparatus for semiconductor processing

US Patent 7225820 High-pressure processing chamber for a semiconductor wafer

US Patent 7244335 Substrate processing system and substrate processing method

US Patent 7255773 Plasma processing apparatus and evacuation ring

US Patent 7282112 Method and apparatus for an improved baffle plate in a plasma processing system

US Patent 7316761 Apparatus for uniformly etching a dielectric layer

US Patent 7331307 Thermally sprayed member, electrode and plasma processing apparatus using the electrode

US Patent 7332038 Device for depositing in particular crystalline layers on one or more, in particular likewise crystalline substrates

US Patent 7335266 Method of forming a controlled and uniform lightly phosphorous doped silicon film

US Patent 7347900 Chemical vapor deposition apparatus and method

US Patent RE40195 Large area plasma source

US Patent 7350476 Method and apparatus to determine consumable part condition

US Patent 7354500 Mask and apparatus using it to prepare sample by ion milling

US Patent 7361228 Showerheads for providing a gas to a substrate and apparatus

US Patent 7361229 Device for deposition with chamber cleaner and method for cleaning chamber

US Patent 7387685 Apparatus and method for depositing materials onto microelectronic workpieces

US Patent 7399364 Hermetic cap layers formed on low-κ films by plasma enhanced chemical vapor deposition

US Patent 7413627 Deposition chamber and method for depositing low dielectric constant films

US Patent 7416635 Gas supply member and plasma processing apparatus

US Patent 7422635 Methods and apparatus for processing microfeature workpieces, e.g., for depositing materials on microfeature workpieces

US Patent 7430986 Plasma confinement ring assemblies having reduced polymer deposition characteristics

US Patent 7444955 Apparatus for directing plasma flow to coat internal passageways

US Patent 7481886 Plasma process system and plasma process method

US Patent 7481889 Film forming apparatus and film forming method

US Patent 7481903 Processing device and method of maintaining the device, mechanism and method for assembling processing device parts, and lock mechanism and method for locking the lock mechanism

US Patent 7487739 Sublimation containment apparatus and method for developing latent fingerprints

US Patent 7494560 Non-plasma reaction apparatus and method

US Patent 7510624 Self-cooling gas delivery apparatus under high vacuum for high density plasma applications

US Patent 7513953 Continuous system for depositing films onto plastic bottles and method

US Patent 7537673 Plasma processing apparatus

US Patent 7547363 Solid organometallic compound-filled container and filling method thereof

US Patent 7552521 Method and apparatus for improved baffle plate

US Patent 7582184 Plasma processing member

US Patent 7611587 Thin-film deposition evaporator

US Patent 7618493 Device and method for manufacturing thin films

US Patent 7632354 Thermal processing system with improved process gas flow and method for injecting a process gas into a thermal processing system

US Patent 7632355 Apparatus and method of treating fine powders

US Patent 7635418 Plasma processing apparatus and methods for removing extraneous material from selected areas on a substrate

US Patent 7645341 Showerhead electrode assembly for plasma processing apparatuses

US Patent 7648579 Substrate support system for reduced autodoping and backside deposition

US Patent 7648610 Baffle plate, apparatus for producing the same, method of producing the same, and gas processing apparatus containing baffle plate

US Patent 7651568 Plasma enhanced atomic layer deposition system

US Patent 7651569 Pedestal for furnace

US Patent 7651570 Solid precursor vaporization system for use in chemical vapor deposition

US Patent 7670431 Carbon nanotube manufacturing apparatus and method, and gas decomposer for use in the manufacturing apparatus and method

US Patent 7674336 Processing apparatus

US Patent 7691203 Film forming apparatus

US Patent 7691204 Film formation apparatus and methods including temperature and emissivity/pattern compensation

US Patent 7691205 Substrate-supporting device

US Patent 7699932 Reactors, systems and methods for depositing thin films onto microfeature workpieces

US Patent 7704326 Deposition mask and manufacturing method thereof

US Patent 7705330 Electron beam irradiation device

US Patent 7708860 Plasma processing apparatus

US Patent 7713354 Film forming method, film forming system and recording medium

US Patent 7718004 Gas-introducing system and plasma CVD apparatus

US Patent 7718030 Method and system for controlling radical distribution

US Patent 7771564 Plasma processing apparatus

US Patent 7780790 Vacuum processing apparatus

US Patent 7780791 Apparatus for an optimized plasma chamber top piece

US Patent 7802538 Method to deposit functionally graded dielectric films via chemical vapor deposition using viscous precursors

US Patent 7806982 Apparatus for fabricating electroluminescent display device

US Patent 7828899 In-line, pass-by system and method for disc vapor lubrication

US Patent 7833355 Carbon nanotube (CNT) extrusion methods and CNT wire and composites

US Patent 7837797 Systems and methods for forming niobium and/or vanadium containing layers using atomic layer deposition

US Patent 7850778 Apparatus and method for growing fullerene nanotube forests, and forming nanotube films, threads and composite structures therefrom

US Patent 7875119 Apparatus and method for coating an article

US Patent 7879149 Vacuum processing apparatus

US Patent 7879151 Mask etch processing apparatus

US Patent 7879183 Apparatus and method for front side protection during backside cleaning

US Patent 7883580 System and method for nanotube growth via Ion implantation using a catalytic transmembrane

US Patent 7918938 High temperature ALD inlet manifold

US Patent 7921802 System and method for suppression of wafer temperature drift in cold-wall CVD systems

US Patent 7926445 Oxidizing method and oxidizing unit for object to be processed

US Patent 7927425 Power-delivery mechanism and apparatus of plasma-enhanced chemical vapor deposition using the same

US Patent 7931749 Shower head and film-forming device using the same

US Patent 7938080 Method for using film formation apparatus

US Patent 7951242 Apparatus for forming structured material for energy storage device and method

US Patent 7954452 Film formation apparatus for semiconductor process and method for using the same

US Patent 7955986 Capacitively coupled plasma reactor with magnetic plasma control

US Patent 7963247 Diffusion tube, dopant source for a diffusion process and diffusion method using the diffusion tube and the dopant source

US Patent 7966969 Deposition of TiN films in a batch reactor

US Patent 7976631 Multi-gas straight channel showerhead

US Patent 8006639 Catalytic enhanced chemical vapor deposition apparatus having efficient filament arrangement structure

US Patent 8012261 ALD apparatus and method

US Patent 8012304 Plasma reactor with a multiple zone thermal control feed forward control apparatus