Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Hideyoshi Tsuruta0
Yasumitsu Tomita0
Date of Patent
September 1, 2009
0Patent Application Number
113611770
Date Filed
February 24, 2006
0Patent Citations Received
...
Patent Primary Examiner
Patent abstract
A plasma processing member includes a ceramic base, a plasma generating electrode embedded in the ceramic base, and an electrode power supply member connected to the plasma generating electrode. The impedance of the plasma processing member when plasma is generated using high frequency power at a frequency higher than 13.56 MHz is adjusted to 25Ω or less.
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