Log in
Sign up
Golden has been acquired by ComplyAdvantage.Read about it here ⟶
‌

US Patent 9870898 Plasma processing method and plasma processing apparatus

Patent 9870898 was granted and assigned to Tokyo Electron on January, 2018 by the United States Patent and Trademark Office.

OverviewStructured DataIssuesContributorsActivity

All edits

Edits on 23 Oct, 2024
"update inverses"
Golden AI profile picture
Golden AI
edited on 23 Oct, 2024
Edits made to:
Infobox (+1 properties)
Infobox
Patent Citations Received
‌
US Patent 12125673 Pulsed voltage source for plasma processing applications
0
Edits on 9 Oct, 2024
"update inverses"
Golden AI profile picture
Golden AI
edited on 9 Oct, 2024
Edits made to:
Infobox (+1 properties)
Infobox
Patent Citations Received
‌
US Patent 12111341 In-situ electric field detection method and apparatus
0
Edits on 3 Oct, 2024
"update inverses"
Golden AI profile picture
Golden AI
edited on 3 Oct, 2024
Edits made to:
Infobox (+1 properties)
Infobox
Patent Citations Received
‌
US Patent 12106938 Distortion current mitigation in a radio frequency plasma processing chamber
0
Edits on 7 Aug, 2024
"update inverses"
Golden AI profile picture
Golden AI
edited on 7 Aug, 2024
Edits made to:
Infobox (+1 properties)
Infobox
Patent Citations Received
0
Edits on 1 May, 2024
"update inverses"
Golden AI profile picture
Golden AI
edited on 1 May, 2024
Edits made to:
Infobox (+1 properties)
Infobox
Patent Citations Received
‌
US Patent 11972924 Pulsed voltage source for plasma processing applications
0
Edits on 24 Apr, 2024
"update inverses"
Golden AI profile picture
Golden AI
edited on 24 Apr, 2024
Edits made to:
Infobox (+1 properties)
Infobox
Patent Citations Received
‌
US Patent 11967483 Plasma excitation with ion energy control
0
Edits on 7 Dec, 2023
"Add patent abstract"
Golden AI profile picture
Golden AI
edited on 7 Dec, 2023
Edits made to:
Article (+831 characters)
Article

Patent abstract

A plasma processing method includes applying a pulse wave of high frequency electric power for plasma generation and a pulse wave of high frequency electric power for bias whose frequency is lower than that of the high frequency electric power for plasma generation on the mounting table; and controlling the pulse wave of the high frequency electric power for plasma generation and the pulse wave of the high frequency electric power for bias such that a predetermined phase difference is generated between the pulse wave of the high frequency electric power for plasma generation and the pulse wave of the high frequency electric power for bias, and a duty ratio of the high frequency electric power for plasma generation becomes greater than or equal to a duty ratio of the high frequency electric power for bias.

Edits on 5 Oct, 2023
"update inverses"
Golden AI profile picture
Golden AI
edited on 5 Oct, 2023
Edits made to:
Infobox (+1 properties)
Infobox
Patent Citations Received
‌
US Patent 11776788 Pulsed voltage boost for substrate processing
Edits on 12 Jul, 2023
"update inverses"
Golden AI profile picture
Golden AI
edited on 12 Jul, 2023
Edits made to:
Infobox (+1 properties)
Infobox
Patent Citations Received
‌
US Patent 11699572 Feedback loop for controlling a pulsed voltage waveform
0
Edits on 25 May, 2023
"Remove leading 0 from patent number"
Golden AI profile picture
Golden AI
edited on 25 May, 2023
Edits made to:
Infobox (+1/-1 properties)
‌

US Patent 09870898 Plasma processing method and plasma processing apparatus US Patent 9870898 Plasma processing method and plasma processing apparatus

Infobox
Patent Number
0987089800
Patent Number
987089800
Edits on 24 Apr, 2023
"Entity importer update"
Golden AI profile picture
Golden AI
edited on 24 Apr, 2023
Infobox
Is a
Patent
Patent
0
Patent Applicant
Tokyo Electron
Tokyo Electron
0
Current Assignee
Tokyo Electron
Tokyo Electron
0
Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
0
Patent Number
098708980
Date of Patent
January 16, 2018
0
Patent Application Number
150189810
Date Filed
February 9, 2016
0
Patent Primary Examiner
‌
Allan Olsen
0
Edits on 25 Sep, 2022
"Entity importer update"
Golden AI profile picture
Golden AI
edited on 25 Sep, 2022
Infobox
Is a
Patent
Patent
0
Patent Applicant
Tokyo Electron
Tokyo Electron
0
Current Assignee
Tokyo Electron
Tokyo Electron
0
Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
0
Patent Number
098708980
Date of Patent
January 16, 2018
0
Patent Application Number
150189810
Date Filed
February 9, 2016
0
Patent Primary Examiner
‌
Allan Olsen
0
Edits on 16 Jan, 2022
"Created via: Entity Importer"
Golden AI profile picture
Golden AI
created this topic on 16 Jan, 2022
Edits made to:
Infobox (+9 properties)
‌

 US Patent 09870898 Plasma processing method and plasma processing apparatus

Infobox
Is a
Patent
Patent
Patent applicant
Tokyo Electron
Tokyo Electron
Current assignee
Tokyo Electron
Tokyo Electron
Patent jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
Patent number
09870898
Date of patent
January 16, 2018
Patent application number
15018981
Date Filed
February 9, 2016
Patent primary examiner
‌
Allan Olsen

Find more entities like US Patent 9870898 Plasma processing method and plasma processing apparatus

Use the Golden Query Tool to find similar entities by any field in the Knowledge Graph, including industry, location, and more.
Open Query Tool
Access by API
Golden Query Tool
Golden logo
By using this site, you agree to our Terms of Service.