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US Patent 9677176 Multi-plenum, dual-temperature showerhead

OverviewStructured DataIssuesContributorsActivity
Is a
Patent
Patent
Date Filed
July 3, 2013
Date of Patent
June 13, 2017
Patent Application Number
13934597
Patent Citations Received
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US Patent 11697877 High temperature face plate for deposition application
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US Patent 12077859 Variable cycle and time RF activation method for film thickness matching in a multi-station deposition system
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US Patent 11834743 Segmented showerhead for uniform delivery of multiple precursors
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US Patent 11911780 Apparatus and method for coating substrates with washcoats
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US Patent 12000047 Integrated showerhead with thermal control for delivering radical and precursor gas to a downstream chamber to enable remote plasma film deposition
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US Patent 11970775 Showerhead for providing multiple materials to a process chamber
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US Patent 12116669 Integrated showerhead with improved hole pattern for delivering radical and precursor gas to a downstream chamber to enable remote plasma film deposition
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US Patent 12087573 Modulation of oxidation profile for substrate processing
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Patent Inventor Names
Ramesh Chandrasekharan
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Jennifer L. Petraglia
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Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
Patent Number
9677176
Patent Primary Examiner
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Rudy Zervigon

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