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US Patent 9677176 Multi-plenum, dual-temperature showerhead

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US Patent 12116669 Integrated showerhead with improved hole pattern for delivering radical and precursor gas to a downstream chamber to enable remote plasma film deposition
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US Patent 12087573 Modulation of oxidation profile for substrate processing
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US Patent 11970775 Showerhead for providing multiple materials to a process chamber
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US Patent 11911780 Apparatus and method for coating substrates with washcoats
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US Patent 11834743 Segmented showerhead for uniform delivery of multiple precursors
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Patent abstract

A dual-temperature, multi-plenum showerhead for use in semiconductor processing equipment is described. The showerhead may supply multiple separate gases to a wafer reaction area while keeping the gases largely segregated within the showerhead. Additionally, the showerhead may be configured to allow a faceplate of the showerhead to be maintained at a significantly higher temperature than the rest of the showerhead.

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Patent Inventor Names
Jennifer L. Petraglia0
Ramesh Chandrasekharan0
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Official Website
https://pdfpiw.uspto.gov/.piw?Docid=09677176
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US Patent 11697877 High temperature face plate for deposition application
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US Patent 09677176 Multi-plenum, dual-temperature showerhead US Patent 9677176 Multi-plenum, dual-temperature showerhead

Infobox
Patent Number
09677176
Patent Number
9677176
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Website URL
https://pdfpiw.uspto.gov/.piw?Docid=09677176
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 US Patent 09677176 Multi-plenum, dual-temperature showerhead

Infobox
Is a
Patent
Patent
Patent jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
Patent number
09677176
Date of patent
June 13, 2017
Patent application number
13934597
Date Filed
July 3, 2013
Patent primary examiner
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Rudy Zervigon

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