Is a
Patent attributes
Patent Jurisdiction
Patent Number
Date of Patent
March 21, 2017
Patent Application Number
14339058
Date Filed
July 23, 2014
Patent Citations Received
0
Patent Primary Examiner
Patent abstract
A system and method for continuous atomic layer deposition. The system and method includes a housing, a moving bed which passes through the housing, a plurality of precursor gases and associated input ports and the amount of precursor gases, position of the input ports, and relative velocity of the moving bed and carrier gases enabling exhaustion of the precursor gases at available reaction sites.
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