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US Patent 9598769 Method and system for continuous atomic layer deposition

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Is a
Patent
Patent

Patent attributes

Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
Patent Number
9598769
Date of Patent
March 21, 2017
Patent Application Number
14339058
Date Filed
July 23, 2014
Patent Citations Received
‌
US Patent 11876174 Methods and materials for protection of sulfide glass solid electrolytes
0
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US Patent 12021187 Surface treatment of a sulfide glass solid electrolyte layer
0
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US Patent 11984553 Lithium ion conducting sulfide glass fabrication
0
0
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US Patent 12021238 Glassy embedded solid-state electrode assemblies, solid-state batteries and methods of making electrode assemblies and solid-state batteries
0
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US Patent 11749834 Methods of making lithium ion conducting sulfide glass
Patent Primary Examiner
‌
Kelly M Gambetta
Patent abstract

A system and method for continuous atomic layer deposition. The system and method includes a housing, a moving bed which passes through the housing, a plurality of precursor gases and associated input ports and the amount of precursor gases, position of the input ports, and relative velocity of the moving bed and carrier gases enabling exhaustion of the precursor gases at available reaction sites.

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