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US Patent 9418897 Wrap around silicide for FinFETs

OverviewStructured DataIssuesContributorsActivity
Is a
Patent
Patent
Date Filed
June 15, 2015
Date of Patent
August 16, 2016
Patent Application Number
14739294
Patent Citations Received
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US Patent 12132091 Work function layers for transistor gate electrodes
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US Patent 12119401 Semiconductor device and methods of forming
0
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US Patent 12125706 Semiconductor device and method of manufacture
0
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US Patent 12125707 Fin field-effect transistor device and method of forming
0
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US Patent 11670683 Semiconductor device with implant and method of manufacturing same
0
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US Patent 11677013 Source/drain epitaxial layers for transistors
0
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US Patent 11688794 Method for epitaxial growth and device
0
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US Patent 11688807 Semiconductor device and methods of forming
0
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US Patent 11688647 Semiconductor device and method for manufacturing the same
0
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US Patent 11682711 Semiconductor device having multi-layered gate spacers
0
•••
Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
Patent Number
9418897
Patent Primary Examiner
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Eduardo A Rodela

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