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US Patent 9330939 Method of enabling seamless cobalt gap-fill

Patent 9330939 was granted and assigned to Applied Materials on May, 2016 by the United States Patent and Trademark Office.

OverviewStructured DataIssuesContributorsActivity
Is a
Patent
Patent
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Current Assignee
Applied Materials
Applied Materials
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Date Filed
March 6, 2013
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Date of Patent
May 3, 2016
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Patent Application Number
13786644
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Patent Citations Received
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US Patent 11881411 High pressure annealing process for metal containing materials
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US Patent 11694912 High pressure and high temperature anneal chamber
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US Patent 11705337 Tungsten defluorination by high pressure treatment
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US Patent 11749555 Semiconductor processing system
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US Patent 11756803 Gas delivery system for high pressure processing chamber
Patent Inventor Names
Xinyu Fu
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Sang-Ho Yu
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Srinivas Gandikota
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Yu Lei
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Avgerinos V. Gelatos
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Bhushan N. Zope
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Bo Zheng
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Mathew Abraham
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Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
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Patent Number
9330939
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Patent Primary Examiner
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Phat X Cao
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