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US Patent 9153442 Processing systems and methods for halide scavenging

Patent 9153442 was granted and assigned to Applied Materials on October, 2015 by the United States Patent and Trademark Office.

OverviewStructured DataIssuesContributors
Is a
Patent
Patent
1
Current Assignee
Applied Materials
Applied Materials
1
Date Filed
April 8, 2014
1
Date of Patent
October 6, 2015
1
Patent Applicant
Applied Materials
Applied Materials
1
Patent Application Number
14248143
1
Patent Citations Received
‌
US Patent 11756803 Gas delivery system for high pressure processing chamber
‌
US Patent 11881411 High pressure annealing process for metal containing materials
3
‌
US Patent 11915950 Multi-zone semiconductor substrate supports
4
‌
US Patent 11682560 Systems and methods for hafnium-containing film removal
5
‌
US Patent 11694912 High pressure and high temperature anneal chamber
6
‌
US Patent 11705337 Tungsten defluorination by high pressure treatment
7
‌
US Patent 11749555 Semiconductor processing system
Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
1
Patent Number
9153442
1
Patent Primary Examiner
‌
Duy Deo
1
Industry
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